Extreme ultraviolet lithography is a lithography technology using a range of extreme ultraviolet wavelengths, roughly spanning a 2% FWHM bandwidth about 13.5 nm.

What is EUV lithography used for?

What is EUV lithopgraphy? EUV (Extreme Ultraviolet) lithography uses an EUV light of the extremely short wavelength of 13.5 nm. It allows exposure of fine circuit patterns with a half-pitch below 20 nm that cannot be exposed by the conventional optical lithography using an ArF excimer laser.

How does EUV lithography work?

It uses extreme ultraviolet (EUV) light at a wavelength of 13.5 nm to make silicon features down to a few nanometers in size on the memory chips and processors of tomorrow. With more than 100,000 components, such an EUV lithography system is one of the most complex machines ever built.