2.1. Ellipsometry – theory. Ellipsometry is a non-destructive optical technique that allows for very precise and accurate analysis of the optical properties of various thin film systems, including film thickness and dielectric constants.

What is ellipsometry used for?

Thus, ellipsometry is primarily used to determine film thickness and optical constants. However, it is also applied to characterize composition, crystallinity, roughness, doping concentration, and other material properties associated with a change in optical response.

What does ellipsometry measure?

By measuring the phase between p- and s-polarized reflected beams, ellipsometry provides precise determination of film thickness, down to sub-monolayer film thicknesses, even though the wavelength of the measuring beam (≈ 500 nm) is very long compared to the film thickness (which can be < 0.1 nm).